Childs, K. D.; Narum, D.; LaVanier, L. A.; Lindley, P. M.; Schueler, B. W.; Mulholland, G. W.; Diebold, A. C.
view article (10.004545)
Comparison of Submicron Particle Analysis by Auger Electron Spectroscopy, Time-of-Flight Secondary Ion Mass Spectrometry, and Secondary Electron Microscopy With Energy Dispersive X-Ray Spectroscopy.
Physical Electronics Inc., Eden Prairie, MN; Charles Evans and Associates, Redwood City, CA; Physical Electronics Inc., Redwood City, CA; National Institute of Standards and Technology, Gaithersburg, MD; Sematech, Austin, TX
Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films,
Vol. 14,
No. 4,
2392-2404,
July/August 1996